Based on our thermal projection lithography platform, ANU-1 reaches 180 nm in resolution with a projected 10 Wafer/Hour throughput (4" wafers).
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Our innovative motorized objective lens swap system, high-resolution cameras, and a unique bend and warp measurement attachment enable automated mapping of samples at high speeds. The software delivers a rich set of data from defect percentage, line uniformity, stitching errors, in addition to high-resolution images (down to 250 nm).
Our all-in one low-cost high-performance system offers a pulse-width 1064 nm pulse-tunable laser (5-1000 ns), a booster, and an amplifier. Pulse energies can exceed 10 mJ at the output. Any combination of up to 4 elements can be included in a single solution (e.g. 2 lasers, 1 booster, 1 amplifier, 3 lasers and one booster etc...). A 532 nm frequency doubled attachment can be added at the output for > 1 mJ green light.
