Unlike conventional photopolymer lithography, thermal lithography relies on thermally-activated resists. The advantages include both sub-wavelength features and immunity to beam imperfections, leading to overall higher resolution and improved yields. By adding parallel laser writing technology, speed-up of up to 100X is achieved compared with conventional direct laser writers.
Innovation is the name of the game
In making ANU-1, our team had to come with multiple innovations, including methods for incorporating real-time metrology into the direct laser writing process, new types of flat lenses, as well as innovations in thermal processing of materials
