ANU-1 is a maskless optical lithography tool built on Nabu's parallel thermal projection platform. It writes patterns directly from a virtual mask, so chip designers can prototype and move into mid-volume production on the same tool, with no photomask cost or lead time.
180 nm
half-pitch resolution
10 WPH
throughput, 4 in wafers
4 / 6 / 8 in
wafer sizes
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No photomask
Designs load as a virtual mask from GDSII or OASIS. A design change goes from file to wafer with no re-tooling.
Thermal resist
Thermally activated resists give sub-wavelength features and immunity to beam imperfections, for higher resolution and yield.
Parallel writing
Massively parallel laser writing is up to 100× faster than conventional direct laser writers. Write speed does not depend on design complexity or resolution.
Fits standard cleanroom processes
Resist is deposited by standard DC or RF sputtering. Developing, etching and lift-off work just as they do with conventional photoresist.
Verify before developing
Patterns can be checked before the wafer is developed. On transparent substrates, features are visible in real time during writing.
Simple facility requirements
No yellow-light room, three-phase power, nitrogen line or water line is required.
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Parameter
ANU-1 today
Roadmap
Resolution
180 nm half-pitch
Sub-100 nm, in lab testing
Alignment
~100 nm
Sub-50 nm
Throughput
10 wafers / hour (4 in)
50 wafers / hour
Exposure source
532 nm
266 nm
Line edge roughness
< 20 nm
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Wafer sizes
4 in, 6 in, 8 in
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Substrates
Substrate-agnostic
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Patterning
Maskless direct write from virtual mask; GDSII / OASIS input
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Resist
Thermal resist, Spin coated, DC or RF sputter-deposited,
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Write speed
Independent of design complexity and resolution
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Cameras
Lens alignment ×1, layer alignment ×4
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Autofocus
Automatic
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Warp / bow compensation
Instantaneous up to 20 µm; up to 100 µm max
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Field
Area
Exposure
Single field
100 × 100 mm²
6 min
4 in wafer
Ø 100 mm
6 min
6 in wafer
Ø 150 mm
6 min
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Requirement
ANU-1
Footprint (W × D × H)
3.5 × 3.5 × 7 ft
Yellow-light room
Not required
Three-phase power
Not required
Nitrogen line
Not required
Water line
Not required
Request a demo or quote
Sample process results are available on request.
johnathan@nabulitho.com · +1 262 646 0177